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Language: en
Pages: 616
Pages: 616
Type: BOOK - Published: 2012-02-17 - Publisher: John Wiley & Sons
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served w
Language: en
Pages: 616
Pages: 616
Type: BOOK - Published: 2012-04-02 - Publisher: John Wiley & Sons
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served w
Language: en
Pages: 545
Pages: 545
Type: BOOK - Published: 2009-09-19 - Publisher: Springer Science & Business Media
In Advanced ULSI interconnects – fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- sca
Language: en
Pages: 312
Pages: 312
Type: BOOK - Published: 2010 - Publisher: World Scientific
Electromigration in ULSI Interconnections provides a comprehensive description of the electromigration in integrated circuits. It is intended for both beginner
Language: en
Pages: 688
Pages: 688
Type: BOOK - Published: 2003-10-06 - Publisher: John Wiley & Sons
More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale Integration (ULSI) ref