Chemical Vapor Deposition of Silicon-germanium-carbon Films
Author | : Pankaj Neelkanth Joshi |
Publisher | : |
Total Pages | : 294 |
Release | : 1998 |
ISBN-10 | : OCLC:40217498 |
ISBN-13 | : |
Rating | : 4/5 ( Downloads) |
Book Synopsis Chemical Vapor Deposition of Silicon-germanium-carbon Films by : Pankaj Neelkanth Joshi
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