Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics: Volume 990
| Author | : Qinghuang Lin |
| Publisher | : |
| Total Pages | : 366 |
| Release | : 2007-09-12 |
| ISBN-10 | : UVA:X030257167 |
| ISBN-13 | : |
| Rating | : 4/5 ( Downloads) |
Book Synopsis Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics: Volume 990 by : Qinghuang Lin
Download or read book Materials, Processes, Integration and Reliability in Advanced Interconnects for Micro- and Nanoelectronics: Volume 990 written by Qinghuang Lin and published by . This book was released on 2007-09-12 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
