Electromigration Modeling at Circuit Layout Level

Electromigration Modeling at Circuit Layout Level
Author :
Publisher : Springer Science & Business Media
Total Pages : 111
Release :
ISBN-10 : 9789814451215
ISBN-13 : 9814451215
Rating : 4/5 (215 Downloads)

Book Synopsis Electromigration Modeling at Circuit Layout Level by : Cher Ming Tan

Download or read book Electromigration Modeling at Circuit Layout Level written by Cher Ming Tan and published by Springer Science & Business Media. This book was released on 2013-03-16 with total page 111 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated circuit (IC) reliability is of increasing concern in present-day IC technology where the interconnect failures significantly increases the failure rate for ICs with decreasing interconnect dimension and increasing number of interconnect levels. Electromigration (EM) of interconnects has now become the dominant failure mechanism that determines the circuit reliability. This brief addresses the readers to the necessity of 3D real circuit modelling in order to evaluate the EM of interconnect system in ICs, and how they can create such models for their own applications. A 3-dimensional (3D) electro-thermo-structural model as opposed to the conventional current density based 2-dimensional (2D) models is presented at circuit-layout level.


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